Download When The Shooting Stops ... The Cutting Begins: A Film by Ralph Rosenblum, Robert Karen PDF

By Ralph Rosenblum, Robert Karen

Publish yr note: First released in 1979

The tale of 1 of crucial and least-understood jobs in moviemaking—film editing—is right here advised via one of many wizards, Ralph Rosenblum, whose credentials comprise six Woody Allen movies, in addition to The Pawnbroker, The Producers, and Goodbye, Columbus.

Rosenblum and journalist Robert Karen have written either a background of the career and a private account, a hugely wonderful, instructive, and revelatory publication that may make any reader a extra conscious movie-viewer.

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Extra info for When The Shooting Stops ... The Cutting Begins: A Film Editor's Story

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Electrophoretic coating is based on deposition of a film from a dispersion of colloidal particles onto a conductive substrate. The dispersion in a conductive liquid dissociates into negatively charged colloidal particles and positive ions (cations), or the reverse. On application of an electric field between the positive substrate electrode (anode), the colloidal particles migrate to the substrate, become discharged, and form a film. Chemical or electrochemical treatments of a metal surface can produce a thin and adherent layer on that metal.

Heteroepitaxy growth in which the epitaxial layer is a different material from the substrate. Virtually all commercial silicon epitaxy is homoepitaxy, with the exception of silicon-on-sapphire. Epitaxial silicon layers can be created by a wide range of techniques, including evaporation, sputtering, molecular beams, and various 45 46 Thin-Film Deposition Processes and Technologies � regrowth concepts. [1][2] Chemical vapor deposition is the formation of stable solids by decomposition of gaseous chemicals using heat, plasma, ultraviolet, or other energy sources, or a combination of sources.

Only the future outlook for the requirements and applications of such equipment is discussed in the following chapters in this book. The deposition equipment for the research and development of new device structures has to meet, in general, quite different requirements than the equipment used in the manufacturing of devices on a large scale. Research and development equipment requires a high degree of flexibility in deposition parameters, in accommodation of a variety of substrates, and in process monitoring equipment.

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